Structures having lattice-mismatched single-crystalline semiconductor layers on the same lithographic level and methods of manufacturing the same

ABSTRACT

A semiconductor substrate containing a single crystalline group IV semiconductor is provided. A single crystalline lattice mismatched group IV semiconductor alloy layer is epitaxially grown on a portion of the semiconductor layer, while another portion of the semiconductor layer is masked. The composition of the lattice mismatched group IV semiconductor alloy layer is tuned to substantially match the lattice constant of a single crystalline compound semiconductor layer, which is subsequently epitaxially grown on the single crystalline lattice mismatched group IV semiconductor alloy layer. Thus, a structure having both the group IV semiconductor layer and the single crystalline compound semiconductor layer is provided on the same semiconductor substrate. Group IV semiconductor devices, such as silicon devices, and compound semiconductor devices, such as GaAs devices having a laser emitting capability, may be formed on the on the same lithographic level of the semiconductor substrate.

FIELD OF THE INVENTION

The present invention relates to semiconductor structures, andparticularly to semiconductor structures having lattice mismatchedsemiconductor layers on the same lithographic level and methods ofmanufacturing the same.

BACKGROUND OF THE INVENTION

Group IV element based semiconductor devices, e.g., silicon and/orgermanium based semiconductor devices, are commonly used in thesemiconductor industry to form semiconductor chips in part due toavailability of group IV element semiconductor substrates. Particularly,silicon based substrates containing silicon, silicon germanium alloy, orsilicon carbon alloy are commonly available in semiconductor industry ata low cost. In the case of silicon substrates, wafers having a diameterof 300 mm are commonly used in mass manufacturing. Thus, group IVelement based semiconductor devices, and particularly, silicon baseddevices, formed on silicon containing substrates form a majority ofsemiconductor components utilized in semiconductor chips.

A compound semiconductor is a semiconductor comprising elements from twoor more different groups of the periodic table. Compound semiconductorsmay be binary, ternary, or quaternary, i.e., may have two, three, orfour distinct elements. Exemplary III-V binary compound semiconductorsinclude AlN, AlP, AlAs, GaN, GaP, GaAs, InP, InAs, InSb, etc. ExemplaryII-VI compounds include ZnS, ZnSe, ZnTe, CdTe, HgTe, etc. Exemplaryternary compound semiconductors include AlInGaP, AlGaAs, InGaN, andCdHgTe. Exemplary quaternary compound semiconductors include InGaAsP.

Semiconductor devices formed from compound semiconductors may offerperformance advantages over silicon based semiconductor devices. Forexample, GaAs has a higher saturated electron velocity and higherelectron mobility than silicon, enabling a higher device operationfrequency. Also, GaAs devices in general have higher breakdown voltagesand generate less noise during a high frequency operation than siliconbased devices of comparable dimensions. Further, the band structure ofGaAs contains a direct band gap between the conduction band and thevalence band, enabling emission of light. For the above reasons, GaAscircuitry is employed in communication devices, microwave devices, andradar systems. Likewise, other compound semiconductors offer distinctadvantages over silicon for some semiconductor applications.

In general, compound semiconductors and/or semiconductor devices formedtherefrom also have some disadvantages compared with group IVsemiconductor elements. For example, mechanical strength of compoundsemiconductors tends to be inferior to that of group IV semiconductorelements, especially that of silicon. Also, compound semiconductorsubstrates are harder to manufacture than group IV semiconductor elementsubstrates, especially silicon substrates. This is because silicon ishighly abundant on earth as silicates, while the compound semiconductormaterial tends to be rarer than silicates. Further, stable oxides ofcompound semiconductors are rare while silicon dioxide may be readilyformed and serves as a stable dielectric material.

Therefore, integration of a compound semiconductor material in a groupIV semi-conductor element substrate to form group IV element basedsemiconductor devices and compound semiconductor devices to utilizetheir respective advantages is desired. However, integration of a singlecrystalline compound semiconductor material with a single crystallinegroup IV semiconductor element has proved to be challenging sincecompound semiconductors are in general formed by processing methods thatare uncommon with standard semiconductor processing technologies.Further, due to lattice mismatch between group IV semiconductor elementsand compound semiconductors, formation of a single crystalline compoundsemiconductor layer on a single crystalline group IV semiconductorelement containing substrate typically involves bonding of twosemiconductor materials.

Prior art methods of integrating a compound semiconductor material intoa group IV semiconductor element substrate by growing a thick bufferlayer on a group IV semiconductor element substrate, followed bydeposition of a compound semiconductor layer, have the disadvantage ofrequiring a thick epitaxial growth of buffer layers. Further, only thecompound semiconductor layer is exposed on the top of the substrateafter deposition of the compound semiconductor layer, thus making theportion of the group IV semiconductor element underneath the compoundsemiconductor layer inaccessible for further processing. This approachis also very inconvenient for semiconductor devices employing both acompound semiconductor material and a group IV semiconductor materialsimultaneously.

In view of the above, there is a need to provide a semiconductorstructure having a group IV semiconductor material and a compoundsemiconductor material in proximity of each other on the samelithographic level.

In addition, there exists a need for a semiconductor structure havinglattice mismatched semiconductor layers, e.g., a group IV semiconductorelement layer and a compound semiconductor layer, on the samelithographic level and methods of manufacturing the same.

Further, there exists a need for a semiconductor structure formed on asilicon substrate and having an exposed group IV semiconductor elementlayer for forming group IV semiconductor element based devices and anexposed compound semiconductor layer for forming compound semiconductordevices at the same lithographic level and methods of manufacturing thesame in an economical manner

SUMMARY OF THE INVENTION

The present invention addresses the needs described above by providingstructures and fabrication methods for a single crystalline group IVsemiconductor layer and a single crystalline semiconductor layer that islattice mismatched to, i.e., have a different lattice parameter than,the single crystalline group IV semiconductor layer located on the samelithographic level of the same substrate. Preferably, the latticemismatched single crystalline semiconductor layer comprises a singlecrystalline compound semiconductor.

According to the present invention, a semiconductor substrate containinga single crystalline group IV semiconductor is provided. A singlecrystalline lattice mismatched group IV semiconductor alloy layer isepitaxially grown on a portion of the semiconductor layer, while anotherportion of the semiconductor layer is masked. The composition of a topportion of the lattice mismatched group IV semiconductor alloy layer istuned to substantially match the lattice constant of a singlecrystalline compound semiconductor layer, which is subsequentlyepitaxially grown on the single crystalline lattice mismatched group IVsemiconductor alloy layer. Thus, a structure having both the group IVsemiconductor layer and the single crystalline compound semiconductorlayer is provided on the same semiconductor substrate. Group IVsemiconductor devices, such as silicon devices, and compoundsemiconductor devices, such as GaAs devices having a laser emittingcapability, may be formed on the on the same lithographic level of thesemiconductor substrate.

According to an aspect of the present invention, a semiconductorstructure is provided, which comprises:

a handle substrate,

a buried insulator layer abutting the handle substrate;

at least one single crystalline group IV semiconductor structure havinga first lattice constant, abutting the buried insulator layer, andcomprising a material selected from silicon, germanium, carbon and analloy thereof;

a single crystalline lattice mismatched group IV semiconductor alloylayer located on the buried insulator layer and containing a top portionhaving a third lattice constant, wherein the second lattice constant isbetween the first lattice constant and the third lattice constant; and

a stack of single crystalline compound semiconductor layers.

The stack of single crystalline compound semiconductor layers maycontain:

a first single crystalline compound semiconductor layer abutting thesingle crystalline lattice mismatched group IV semiconductor alloy layerand having substantially the same lattice constant as the second latticeconstant;

a second single crystalline compound semiconductor layer abutting andepitaxially aligned to the first single crystalline compoundsemiconductor layer; and

a third single crystalline compound semiconductor layer abutting andepitaxially aligned to the second single crystalline compoundsemiconductor layer.

The at least one single crystalline group IV semiconductor structure maycomprise a wave guide.

The waveguide may have an increasing cross-sectional area with distancefrom the stack up to a first distance, wherein the distance is themagnitude of the shortest vector of all vectors connecting a given pointwithin the wave guide and any of the points within the stack, and thecross-sectional area is measured in the plane perpendicular to theshortest vector.

The semiconductor structure may farther comprise a near-infraredtransparent layer abutting the stack and the wave guide.

The second single crystalline compound semiconductor layer may comprisea material having a direct band gap and is capable of amplifying oremitting a laser light.

The first single crystalline compound semiconductor layer and the thirdsingle crystalline compound semiconductor layer may compriseGaAs_(1−x)P_(x) and the second single crystalline compound semiconductorlayer may comprise GaAs_(1−y)N_(y), wherein x is in the range from about0.001 to about 0.999 and y is in the range from about 0.001 to about0.10.

The first single crystalline compound semiconductor layer may have alength from about 1 μm to about 1 cm and a width from about 200 nm toabout 20 μm, wherein the length is greater than the width.

The second single crystalline compound semiconductor layer may have athickness from about 1 nm to about 100 nm and the first and third singlecrystalline compound semiconductor layers have a thickness from about 50nm to about 3 μm.

The range of the vertical height of the second single crystallinecompound semiconductor layer may be within the range of the verticalheight of the wave guide.

According to another aspect of the present invention, anothersemiconductor structure is provided, which comprises:

a handle substrate,

a buried insulator layer abutting the handle substrate;

a first single crystalline group IV semiconductor layer verticallyabutting the buried insulator layer and having a first lattice constant,and comprising a material selected from silicon, germanium, carbon andan alloy thereof;

a second single crystalline group IV semiconductor layer verticallyabutting the buried insulator layer, disjoined from the first singlecrystalline group IV semiconductor layer, and containing having thefirst lattice constant, and comprising the same material as the firstsingle crystalline group IV semiconductor structure;

a single crystalline lattice mismatched group IV semiconductor alloylayer vertically abutting the second single crystalline group IVsemiconductor layer and containing a top portion having a second latticeconstant, wherein the second lattice constant is different from thefirst lattice constant; and

at least one single crystalline compound semiconductor layer abuttingthe single crystalline lattice mismatched group IV semiconductor alloylayer and having a third lattice constant, wherein the second latticeconstant is between the first lattice constant and the third latticeconstant, wherein a top surface of the first single crystalline group IVsemiconductor structure and a top surface of the at least one singlecrystalline compound semiconductor layer are on the same lithographiclevel.

In one embodiment, the top surface of the first single crystalline groupIV semiconductor structure and the top surface of the at least onesingle crystalline compound semiconductor layer have a vertical distanceless than 1,000 nm.

According to yet another aspect of the present invention, yet anothersemiconductor structure is provided, which comprises:

a handle substrate,

a buried insulator layer abutting the handle substrate;

a single crystalline group IV semiconductor layer vertically abuttingthe buried insulator layer and having a first lattice constant, andcomprising a material selected from silicon, germanium, carbon and analloy thereof;

a single crystalline lattice mismatched group IV semiconductor alloylayer vertically abutting the buried insulator layer and containing atop portion having a second lattice constant, wherein the second latticeconstant is different from the first lattice constant; and

at least one single crystalline compound semiconductor layer abuttingthe single crystalline lattice mismatched group IV semiconductor alloylayer and having a third lattice constant, wherein the second latticeconstant is between the first lattice constant and the third latticeconstant, wherein a top surface of the first single crystalline group IVsemiconductor structure and a top surface of the at least one singlecrystalline compound semiconductor layer are on the same lithographiclevel.

In one embodiment, the top surface of the first single crystalline groupIV semiconductor structure and the top surface of the at least onesingle crystalline compound semiconductor layer have a vertical distanceless than 1,000 nm.

According to still another aspect of the present invention, a method offorming a semiconductor structure is provided, which comprises:

providing a semiconductor-on-insulator layer having a single crystallinegroup IV semiconductor layer and having a first lattice constant,wherein the single crystalline group IV semiconductor layer comprises amaterial selected from silicon, germanium, carbon and an alloy thereof;

forming at least one isolation trench in the single crystalline group IVsemiconductor layer and forming a first region and a second region outof the remaining portions of the single crystalline group IVsemiconductor layer, wherein the first and second regions are separatedby the at least one isolation trench;

masking the first region with an inorganic masking layer or anear-infrared wavelength transparent layer;

forming a single crystalline lattice mismatched group IV semiconductoralloy layer abutting the second region and containing a top portionhaving a second lattice constant, wherein the second lattice constant isdifferent from the first lattice constant; and

epitaxially growing at least one single crystalline compoundsemiconductor layer abutting the single crystalline lattice mismatchedgroup IV semiconductor alloy layer, wherein the single crystallinecompound semiconductor layer has a third lattice constant, wherein saidsecond lattice constant is between the first lattice constant and thethird lattice constant.

In an embodiment, the forming of the single crystalline group IVsemiconductor alloy may comprise:

forming a group IV alloy region directly on the second region, whereinthe group IV alloy region comprises a different group IV element fromthe element of the single crystalline group IV semiconductor layer; and

annealing the group IV alloy region and the second region to diffuse thecompositional interface between the said another group IV region andsaid second region to form a single alloyed region with either graded oruniform composition, which constitutes said single crystalline group IVsemiconductor alloy.

In another embodiment, the forming of the single crystalline latticemismatched group IV semiconductor alloy layer may comprise selectiveepitaxial deposition of a single crystalline lattice mismatched group IVsemiconductor alloy layer directly on the second portion, while thesingle crystalline lattice mismatched group IV semiconductor alloy layerdoes not substantially grow over the inorganic masking layer or thenear-infrared wavelength transparent layer.

In yet another embodiment, the forming of the single crystalline latticemismatched group IV semiconductor alloy layer may comprise:

non-selective epitaxial deposition of a single crystalline latticemismatched group IV semiconductor alloy layer directly on the secondportion, while forming a non-single crystalline group IV semiconductoralloy on the inorganic masking layer or the near-infrared wavelengthtransparent layer; and

removing the non-single crystalline group IV semiconductor alloy fromabove the inorganic masking layer or the near-infrared wavelengthtransparent layer.

The second region may be thinned prior to forming of the singlecrystalline lattice mismatched group IV semiconductor alloy layer.

At least one single crystalline group IV semiconductor structure may beformed out of the first region. The at least one single crystallinegroup IV semiconductor structure may be a wave guide.

The wave guide may have an increasing cross-sectional area with distancefrom the stack up to a first distance, wherein the distance is themagnitude of the shortest vector of all vectors connecting a given pointwithin the wave guide and any of the points within the stack, and thecross-sectional area is measured in the plane perpendicular to theshortest vector.

The epitaxially growing of at least one single crystalline compoundsemiconductor layer may comprise:

epitaxially growing a first single crystalline compound semiconductorlayer having the third lattice constant directly on the singlecrystalline lattice mismatched group IV semiconductor alloy layer;

epitaxially growing a second single crystalline compound semiconductorlayer directly on the first single crystalline compound semiconductorlayer; and

epitaxially growing a third single crystalline compound semiconductorlayer directly on second single crystalline compound semiconductorlayer.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A-1H show vertical cross-sectional views of a first exemplarysemiconductor structure at various stages of manufacturing.

FIGS. 2A-2F show vertical cross-sectional views of a second exemplarysemiconductor structure at various stages of manufacturing.

FIGS. 3A-3F show vertical cross-sectional views of a third exemplarysemiconductor structure at various stages of manufacturing.

FIGS. 4A-4C show vertical cross-sectional views of a fourth exemplarysemiconductor structure at various stages of manufacturing.

FIGS. 5A-5C show a fifth exemplary semiconductor structure. FIG. 5A is atop-down view; FIG. 5B is a vertical cross-sectional view along theplane B-B′; and FIG. 5C is a vertical cross-sectional view along theplane C-C′.

DETAILED DESCRIPTION OF THE INVENTION

As stated above, the present invention relates to semiconductorstructures having lattice mismatched semiconductor layers on the samelithographic level and methods of manufacturing the same, which are nowdescribed in detail with accompanying figures. It is noted that like andcorresponding elements are referred to by like reference numerals.

The present invention enables structures and methods for multiple singlecrystalline semiconductor layers having different lattice constants onthe same lithographic level of the same semiconductor substrate. Apreferred embodiment of the present invention in which a group IVsemiconductor layer and a single crystalline compound semiconductorlayers having different lattice constants are described herein. Further,a specific exemplary structure is described, which contains a stack ofsingle crystalline compound semiconductor layers capable of generatingor amplifying a laser light and at least one single crystalline group IVsemiconductor structure capable of guiding the laser light. One skilledin the art may derive other useful structures from the structuresdescribed herein.

Referring to FIG. 1A, a first exemplary structure according to a firstembodiment of the present invention comprises asemiconductor-on-insulator substrate comprising a handle substrate 10, aburied insulator layer 20, and a single crystalline group IVsemiconductor layer 29. The handle substrate 10 comprises asemiconductor material such as silicon, silicon carbon alloy, silicongermanium alloy, silicon carbon germanium alloy, GaAs, InAs, anotherIII-V compound semiconductor material, or one of II-IV compoundsemiconductors. Preferably, the handle substrate 10 is a siliconsubstrate. The buried insulator layer 20 may comprise a dielectricmaterial such as an oxide or a nitride. Preferably, the buried insulatorlayer 20 comprises silicon oxide.

The single crystalline group IV semiconductor layer 29 comprisessilicon, germanium, carbon, or an alloy thereof. For example, the singlecrystalline group IV semiconductor layer 29 may be a single crystallinesilicon layer, a single crystalline germanium layer, a singlecrystalline silicon germanium alloy layer that may, or may not, have agraded composition, a single crystalline silicon carbon alloy layer, ora single crystalline silicon germanium carbon alloy layer. The thicknessof the single crystalline group IV semiconductor layer 29 may be fromabout 100 nm to about 6 μm. The single crystalline group IVsemiconductor layer 29 may be intrinsic or may be doped with electricaldopants such as B, Ga, In, P, As, and Sb. The single crystalline groupIV semiconductor layer 29 has a first lattice constant. For example, thefirst lattice constant is substantially the same as 0.543095 nm at 300Kin case of a silicon layer, or is substantially the same as 0.564613 nmat 300K in case of a germanium layer. Other values of the first latticeconstant may be obtained by suitable alloying of the group IV elements.

Referring to FIG. 1B, the single crystalline group IV semiconductorlayer 29 is lithographically patterned and etched to form at least oneisolation trench T in the single crystalline group IV semiconductorlayer 29. Methods of lithographic patterning and etching of the at leastone isolation trench T are well known in the art. A first region 30 anda second region 30′ are formed out of the remaining portions of thesingle crystalline group IV semiconductor layer 29 after the formationof the at least one isolation trench T. The first region 30 and thesecond region 30′ are separated by the at least one isolation trench T.The first region 30 and the second region 30′ have the first latticeconstant.

Referring to FIG. 1C, the first region 30 is masked with an inorganicmasking layer 40. This may be effected by depositing an inorganicmasking layer 40 over the first and second regions (30, 30′) andlithographically patterning and etching the portion of the inorganicmasking layer 40 over the second region 30′, while protecting theportion of the inorganic masking layer 40 over the first region 30 witha remaining portion of a photoresist (not shown). The inorganic maskinglayer 40 may comprise any inorganic material that may withstandsubsequent high temperature processing conditions such as epitaxy ofsemiconductor materials. The inorganic material layer 40 may comprise adielectric material, a semiconductor material, a metal, or a combinationthereof. The inorganic masking layer 40 protects the first region 30during subsequent processing. The inorganic masking material maycomprise a dielectric material on which a semiconductor is notsubstantially deposited during a selective epitaxy. For example, theinorganic masking layer 40 may comprise silicon oxide or siliconnitride. The thickness of the inorganic masking layer 40 may be fromabout 10 nm to about 1 μm.

The overlay between the edge of the remaining portion of the inorganicmasking layer 40 and the second region 30′ may vary. In one embodiment,the edge of the remaining portion of the inorganic masking layer 40 maysubstantially coincide with the edge of the second region 30′. Inanother embodiment, the edge of the remaining portion of the inorganicmasking layer 40 may be located over a portion of the second region 30′.In yet another embodiment, the edge of the remaining portion of theinorganic masking layer 40 may be located within the at least oneisolation trench T. In embodiments employing selective deposition, i.e.,growth of material only from semiconductor surfaces while growth ofsemiconductor material from dielectric surfaces is suppressed, theoverlay of the edge of the remaining portion of the inorganic maskinglayer 40 with the second region 30′ does not play any significant role.In embodiments employing non-selective deposition, i.e., growth ofmaterial from both semiconductor surfaces and dielectric surfaces, it ispreferred the edge of the remaining portion of the inorganic maskinglayer 40 contacts the second region 30′.

Referring to FIG. 1D, the second region 30′ is thinned to form a thinnedsecond region 30″. The thinning of the second region 30′ maybeaccomplished, for example, by a reactive ion etch process that isselective to the inorganic masking layer 40. The thickness of thethinned second region 30″ may be from about 5 nm to about 5 μm, andpreferably from about 10 nm to about 300 nm.

Referring to FIG. 1E, a single crystalline lattice mismatched group IVsemiconductor alloy layer 50 is epitaxially grown directly on thethinned second region 30″. The single crystalline lattice mismatchedgroup IV semiconductor alloy layer 50 comprises at least two group IVelements. The single crystalline lattice mismatched group IVsemiconductor alloy layer 50 may comprise at least two elements selectedfrom the group consisting of carbon, silicon, and germanium. Forexample, the single crystalline lattice mismatched group IVsemiconductor alloy layer 50 may comprise a silicon germanium alloy. Thethickness of the single crystalline lattice mismatched group IVsemiconductor alloy layer 50 may be from about 5 nm to about 4 μm, andpreferably from about 50 nm to about 3 μm.

A top portion of the single crystalline lattice mismatched group IVsemiconductor alloy layer 50 has a second lattice constant that isdifferent from the first lattice constant of the first region 30 and thethinned second region 30″. This may be effected by employing a gradedlayer, in which the composition and lattice parameter changes gradually,for the single crystalline lattice mismatched group IV semiconductoralloy layer 50. Thus, the single crystalline lattice mismatched group IVsemiconductor alloy layer 50 is “lattice mismatched” over the firstlattice constant of the first region 30. However, the degree of latticematch is such that the single crystalline lattice mismatched group IVsemiconductor alloy layer 50 is epitaxially aligned to the thinnedsecond region 30″. The second lattice constant substantially matches thelattice constant of a compound semiconductor material to be subsequentlyformed on the single crystalline lattice mismatched group IVsemiconductor alloy layer 50. While the present invention is describedwith one single crystalline lattice mismatched group IV semiconductoralloy layer 50, a stack of multiple single crystalline latticemismatched group IV semiconductor alloy layers having different latticeparameters amongst one another is explicitly contemplated herein.

The single crystalline lattice mismatched group IV semiconductor alloylayer 50 may be grown by a selective epitaxy in which the material ofthe single crystalline lattice mismatched group IV semiconductor alloylayer 50 is grown on the thinned second region 30″ but no or littlematerial grows on the inorganic masking layer 40. In general, growth ofa crystalline semiconductor material on an amorphous insulator surfaceis inhibited in a selective epitaxy process.

Alternatively, the single crystalline lattice mismatched group IVsemiconductor alloy layer 50 may be grown by a non-selective epitaxy inwhich the material of the single crystalline lattice mismatched group IVsemiconductor alloy layer 50 is grown on the thinned second region 30″,while a polycrystalline or amorphous group IV semiconductor alloy layer(not shown) having substantially the same composition as the singlecrystalline lattice mismatched group IV semiconductor alloy layer 50 isgrown on the inorganic masking layer 40. In this case, thepolycrystalline or amorphous group IV semiconductor alloy layer isremoved, for example, by a wet etch, a reactive ion etch, or byplanarization. Further, the single crystalline lattice mismatched groupIV semiconductor alloy layer 50 may be recessed as necessary to form thestructure of FIG. 1E.

Referring to FIG. 1F, a single crystalline compound semiconductor layer60 is epitaxially grown directly on the single crystalline latticemismatched group IV semiconductor alloy layer 50. The lattice constantof the single crystalline compound semiconductor layer 60 issubstantially the same as the second lattice constant of the singlecrystalline lattice mismatched group IV semiconductor alloy layer 50.The single crystalline compound semiconductor layer 60 may compriseGaAs, InAs, InP, another III-V compound semiconductor alloy, or a II-Vcompound semiconductor alloy that may be epitaxially grown on the singlecrystalline lattice mismatched group IV semiconductor alloy layer 50.For example, the single crystalline compound semiconductor layer 60 maycomprise GaAs_(1−x)P_(x) with the value of x in the range from about0.001 to about 0.999. The thickness of the a single crystalline compoundsemiconductor layer 60 may be from about 5 nm to about 4 μm, andpreferably from about 50 nm to about 3 μm.

The top surface of the single crystalline compound semiconductor layer60 may be located above, at substantially the same height as, or belowthe top surface of the first region 30. Preferably, the top surface ofthe single crystalline compound semiconductor layer 60 is locatedsubstantially at substantially the same height as the top surface of thefirst region 30. Presence of two regions having small enough differencesin the height such that pattern definition on both regions is possiblein the same lithographic process is herein referred to be on the samelithographic level. In general, the permissible height variation betweenthe two regions to be considered as the same lithographic level variesdepending on details of lithographic tools and the photoresist employedin the lithographic processes. For example, the depth of focus of thelithographic system is a measure of the permissible height variation.U.S. Pat. No. 5,422,205 to Inoue et al., the contents of which areherein incorporated by reference, describes the relationship between thedepth of focus and other lithographic process parameters. For MUV andDUV lithographic systems, the depth of focus is from about 100 nm toabout 1,000 nm, and typically from about 200 nm to about 700 nm.

Preferably, the top surface of the single crystalline compoundsemiconductor layer 60 and the top surface of the first region 30 arewithin the same lithographic level in the first exemplary structure.

In the same manner as the formation of the single crystalline latticemismatched group IV semiconductor alloy layer 50 described above, thesingle crystalline compound semiconductor layer 60 may be grown by aselective epitaxy in which the material of the single crystallinecompound semiconductor layer 60 is grown on the single crystallinelattice mismatched group IV semiconductor alloy layer 50 but no orlittle material grows on the inorganic masking layer 40.

Alternatively, the single crystalline compound semiconductor layer 60may be grown by a non-selective epitaxy in which the material of thesingle crystalline compound semiconductor layer 60 is grown on thesingle crystalline lattice mismatched group IV semiconductor alloy layer50, while a polycrystalline or amorphous compound semiconductor layer(not shown) having substantially the same composition as the singlecrystalline compound semiconductor layer 60 is grown on the inorganicmasking layer 40. In this case, the polycrystalline or amorphouscompound semiconductor layer is removed, for example, by a reactive ionetch or by planarization. Further, the single crystalline compoundsemiconductor layer 60 may be recessed as necessary.

Referring to FIG. 1G, the inorganic masking layer 40 may be optionallyremoved. Semiconductor device structures may be formed in the firstregion 30 and/or the single crystalline compound semiconductor layer 60.

Referring to FIG. 1H, shallow trench isolation structures 70 may beoptionally formed between the first region 30 and the stack of thesingle crystalline compound semiconductor layer 60, the singlecrystalline lattice mismatched group IV semiconductor alloy layer 50,and the thinned second region 30″. Portions of the first region 30 andthe stack are etched to form shallow trenches in which the shallowtrench isolation structures 70 are formed. Formation of the shallowtrench isolation structures 70 is particularly useful in casenon-selective epitaxy is employed during the formation of either thesingle crystalline compound semiconductor layer 60 or the singlecrystalline lattice mismatched group IV semiconductor alloy layer 50since non-selective epitaxy tends to leave some polycrystalline oramorphous material on the sidewalls of the inorganic masking layer 40.Such crystalline imperfections are removed during the formation of theshallow trench isolation structures 70. Additional semiconductor devicestructures may be formed in the first region 30 and/or the singlecrystalline compound semiconductor layer 60.

Referring to FIG. 2A, a second exemplary semiconductor structureaccording to a second embodiment of the present invention is formed byfirst providing a first exemplary semiconductor structure shown in FIG.1C.

Referring to FIG. 2B, the single crystalline group IV semiconductorlayer 50 is epitaxially grown directly on the second region 30′ havingthe original thickness. This is unlike the first embodiment in that thesecond region 30′ is not thinned in the second embodiment. Thecomposition and thickness of the single crystalline lattice mismatchedgroup IV semiconductor alloy layer 50 is the same as in the firstembodiment. As in the first embodiment, the single crystalline latticemismatched group IV semiconductor alloy layer 50 has a second latticeconstant that is different from the first lattice constant of the firstregion 30 and the second region 30′. The second lattice constantsubstantially matches the lattice constant of a compound semiconductormaterial to be subsequently formed on the single crystalline latticemismatched group IV semiconductor alloy layer 50. The same methods forepitaxial growth may be employed for the growth of the singlecrystalline group IV semiconductor layer 50 on the second region 30′ inthe second embodiment as the methods for epitaxial growth of the singlecrystalline group IV semiconductor layer 50 in the first embodiment.

Referring to FIG. 2C, a single crystalline compound semiconductor layer60 is epitaxially grown directly on the single crystalline latticemismatched group IV semiconductor alloy layer 50. The composition andthickness of the single crystalline compound semiconductor alloy layer60 is the same as in the first embodiment. The single crystallinecompound semiconductor layer 60 may comprise GaAs, InAs, InP, anotherIII-V compound semiconductor alloy, or a II-V compound semiconductoralloy that may be epitaxially grown on the single crystalline latticemismatched group IV semiconductor alloy layer 50. For example, thesingle crystalline compound semiconductor layer 60 may compriseGaAs_(1−x)P_(x) with the value of x in the range from about 0.001 toabout 0.999. The same methods for epitaxial growth may be employed forthe growth of the single crystalline compound semiconductor layer 60 onthe single crystalline lattice mismatched group IV semiconductor alloylayer 50 in the second embodiment as the methods for epitaxial growth ofthe single crystalline compound semiconductor layer 60 in the firstembodiment. The top surface of the single crystalline compoundsemiconductor layer 60 may be located above, at the same lithographiclevel as, or below, the top surface of the inorganic masking layer 40.Further, the top surface of the single crystalline compoundsemiconductor layer 60 may be located above, at the same lithographiclevel as, or below, the top surface of the first region 30.

Referring to FIG. 2D, shallow trench isolation structures 70 may beoptionally formed between the first region 30 and the stack of thesingle crystalline compound semiconductor layer 60, the singlecrystalline lattice mismatched group IV semiconductor alloy layer 50,and the second region 30′. Portions of the first region 30 and the stackare etched to form shallow trenches in which the shallow trenchisolation structures 70 are formed. Formation of the shallow trenchisolation structures 70 is particularly useful in case non-selectiveepitaxy is employed in prior processing steps for the same reasonsdescribed above. Semiconductor device structures may be formed in thefirst region 30 and/or the single crystalline compound semiconductorlayer 60 at this step.

Referring to FIG. 2E, optionally, a photoresist 71 is applied on thesurface of the shallow trench isolation 70, inorganic masking layer 40,and the single crystalline compound semiconductor layer 60 andlithographically patterned to cover at least a portion of the singlecrystalline compound semiconductor layer 60 and to expose at least aportion of the inorganic masking layer 40. The exposed portion of theinorganic masking layer 40 is etched by a reactive ion etch that employsthe patterned photoresist 71 as an etch mask.

Referring to FIG. 2F, at least a portion of the single crystallinecompound semiconductor layer 60 and at least a portion of the firstregion 30 are exposed. The first region 30 comprises a group IVsemiconductor element having a first lattice constant and the singlecrystalline compound semiconductor layer 60 comprises a compoundsemiconductor having a second lattice constant. Thus, a semiconductorstructure having lattice mismatched semiconductor layers on the samelithographic level is provided. Specifically, a semiconductor structureformed on a handle substrate 10, which may be a silicon substrate, andhaving an exposed group IV semiconductor element layer, e.g., theexposed portion of the first region 30, for forming group IVsemiconductor element based devices, i.e., silicon based devices orgermanium based devices, and an exposed compound semiconductor layer,e.g., the exposed portion of the single crystalline compoundsemiconductor layer 60, for forming compound semiconductor devices atthe same lithographic level.

Referring to FIG. 3A, a third exemplary structure according to a thirdembodiment of the present invention comprises providing a firstexemplary structure as shown in FIG. 1D according to the firstembodiment.

Referring to FIG. 3B, another group IV region 148 is formed on thethinned second region 30″. The another group IV region 148 comprises adifferent material than the single crystalline group IV semiconductormaterial in the thinned second region 30″. For example, in case thefirst region 30 and the thinned second region 30″ comprise silicon, theanother group IV region 148 may comprise germanium, a silicon germaniumalloy, carbon, a silicon carbon alloy, and/or germanium carbon alloy. Incase the first region 30 and the thinned second region 30″ comprisegermanium, the another group IV region 148 may be silicon, a silicongermanium alloy, carbon, a germanium carbon alloy, and/or a siliconcarbon alloy.

Referring to FIG. 3C, the another group IV region 148 and the thinnedsecond region 30″ are annealed to diffuse the another group IV materialinto the thinned second region 30″ to form a graded or uniform secondregion, which is a single crystalline lattice mismatched group IVsemiconductor alloy layer 150 having a second lattice constant that isdifferent from the first lattice constant. The anneal may be a globalanneal, such as a furnace anneal or a rapid thermal anneal (RTA), inwhich the entirety of the third exemplary semiconductor structure isannealed, or alternatively, a local anneal, such as a laser anneal, inwhich the semiconductor material in the thinned second region 30″ islocally annealed without necessarily heating the rest of the thirdexemplary semiconductor structure to the same temperature. The anneal istypically performed at a high temperature in the range from about 500°C. to about 1,400° C.

Referring to FIG. 3D, a single crystalline compound semiconductor layer160 is epitaxially grown directly on the single crystalline latticemismatched group IV semiconductor alloy layer 150. The composition andthickness of the single crystalline compound semiconductor alloy layer160 in the third embodiment is the same as the composition and thicknessof the single crystalline compound semiconductor alloy layer 60 in thefirst embodiment. The single crystalline compound semiconductor layer160 may comprise GaAs, InAs, InP, another III-V compound semiconductoralloy, or a II-V compound semiconductor alloy that may be epitaxiallygrown on the single crystalline lattice mismatched group IVsemiconductor alloy layer 150. For example, the single crystallinecompound semiconductor layer 160 may comprise GaAs_(1−x)P_(x) with thevalue of x in the range from about 0.001 to about 0.999. The samemethods for epitaxial growth may be employed for the growth of thesingle crystalline compound semiconductor layer 160 on the singlecrystalline lattice mismatched group IV semiconductor alloy layer 150 inthe third embodiment as the methods for epitaxial growth of the singlecrystalline compound semiconductor layer 60 in the first embodiment. Thetop surface of the single crystalline compound semiconductor layer 160may be located above, at the same lithographic level as, or below thetop surface of the first region 30. Preferably, the top surface of thesingle crystalline compound semiconductor layer 160 is located at thesame lithographic level as the top surface of top surface of the firstregion 30.

Referring to FIG. 3E, the inorganic masking layer 40 may be optionallyremoved. Semiconductor device structures may be formed in the firstregion 30 and/or the single crystalline compound semiconductor layer160.

Referring to FIG. 3F, shallow trench isolation structures 70 may beoptionally formed between the first region 30 and the stack of thesingle crystalline compound semiconductor layer 160 and the singlecrystalline lattice mismatched group IV semiconductor alloy layer 150.Portions of the first region 30 and the stack are etched to form shallowtrenches in which the shallow trench isolation structures 70 are formed.Formation of the shallow trench isolation structures 70 is particularlyuseful in case non-selective epitaxy is employed for the reasonsdescribed above. Additional semiconductor device structures may beformed in the first region 30 and/or the single crystalline compoundsemiconductor layer 160.

Referring to FIG. 4A, a fourth exemplary semiconductor structureaccording to a fourth embodiment of the present invention is formed byproviding be employing the same manufacturing methods as the thirdexemplary structure as shown in FIG. 3D except that the inorganicmasking layer 40 is replaced with a near-infrared wavelength transparentlayer 140. Further, due to presence of additional single crystallinecompound semiconductor layers in the fourth embodiment, the crystallinecompound semiconductor layer 160 in the third embodiment is referred toas a first single crystalline compound semiconductor layer 160′ in thefourth embodiment. For example, the first single crystalline compoundsemiconductor layer 160′ may comprise GaAs_(1−x)P_(x) with the value ofx in the range from about 0.001 to about 0.999. The first singlecrystalline compound semiconductor layer 160′ may have a thickness fromabout 50 nm to about 3 μm.

The near-infrared wavelength transparent layer 140 is transparent in thenear-infrared wavelength region of spectral wavelengths, which is fromabout 800 nm to about 2,400 nm. Non-limiting examples of materials forthe near-infrared wavelength transparent layer 140 include siliconoxide, silicon nitride, silicon carbide, aluminum oxide, aluminumnitride, and other dielectric materials. In general, any material havinga band gap greater than about 1.5 eV may be employed for thenear-infrared wavelength transparent layer 140.

Referring to FIG. 4B, a second single crystalline compound semiconductorlayer 162 is epitaxially grown directly on the first single crystallinecompound semiconductor layer 160′. The second single crystallinecompound semiconductor layer 162 may comprise GaAs, InAs, InP, anotherIII-V compound semiconductor alloy, or a II-V compound semiconductoralloy that may be epitaxially grown on the first single crystallinecompound semiconductor layer 160′. Preferably, the composition of thesecond single crystalline compound semiconductor alloy layer 162 isdifferent from the composition of the first single crystalline compoundsemiconductor alloy layer 160′. For example, the second singlecrystalline compound semiconductor layer 162 may compriseGaAs_(1−y)N_(y) with the value of y in the range from about 0.001 toabout 0.10.

The same methods for epitaxial growth may be employed for the growth ofthe second single crystalline compound semiconductor layer 162 on thefirst single crystalline compound semiconductor layer 160′ as themethods for epitaxial growth of the single crystalline compoundsemiconductor layer 60 in the first embodiment. The thickness of thesecond single crystalline compound semiconductor layer 162 may be fromabout 0.5 nm to about 200 nm. The top surface of the second singlecrystalline compound semiconductor layer 162 may be located above, atthe same lithographic level as, or below the top surface of the firstregion 30. Preferably, the top surface of the second single crystallinecompound semiconductor layer 162 is located at the same level as the topsurface of the first region 30.

Referring to FIG. 4C, a third single crystalline compound semiconductorlayer 164 is epitaxially grown directly on the second single crystallinecompound semiconductor layer 162. The third single crystalline compoundsemiconductor layer 164 may comprise GaAs, InAs, InP, another III-Vcompound semiconductor alloy, or a II-V compound semiconductor alloythat may be epitaxially grown on the second single crystalline compoundsemiconductor layer 162. Preferably, the composition of the third singlecrystalline compound semiconductor alloy layer 164 is different from thecomposition of the second single crystalline compound semiconductoralloy layer 162. For example, the third single crystalline compoundsemiconductor layer 164 may comprise GaAs_(1−x)P_(x) with the value of xin the range from about 0.001 to about 0.999.

The same methods for epitaxial growth may be employed for the growth ofthe third single crystalline compound semiconductor layer 164 on thesecond single crystalline compound semiconductor layer 162 as themethods for epitaxial growth of the single crystalline compoundsemiconductor layer 60 in the first embodiment. The first singlecrystalline compound semiconductor layer 160′ may have a thickness fromabout 50 nm to about 3 μm. The top surface of the third singlecrystalline compound semiconductor layer 164 may be located above, atthe same lithographic level as, or below the top surface of the firstregion 30.

It will be appreciated that the layer 162 can be formed of a stack ofmultiple, alternating thin layers of two single crystalline compoundsemiconductors of different compositions as to form multiple quantumwells (MQW), which are well known by people skilled in the art.

Referring to FIGS. 5A-5C, a fifth exemplary semiconductor structureaccording to a fifth embodiment of the present invention is shown. FIG.5A is a top-down view; FIG. 5B is a vertical cross-sectional view alongthe plane B-B′; and FIG. 5C is a vertical cross-sectional view along theplane C-C′.

The fifth exemplary semiconductor structure comprises a handle substrate10, a buried insulator layer 20, and at least one single crystallinegroup IV semiconductor structure 34. The at least one single crystallinegroup IV semiconductor structure 34 comprises the material of the firstregion 30 of the first through fourth embodiments, and may be formed bylithographic patterning and etching of the single crystalline group IVsemiconductor layer 29, which comprises silicon or germanium and havinga first lattice constant and a thickness from about 50 nm to about 6 μm.

The fifth exemplary semiconductor structure further comprises thenear-infrared wavelength transparent layer 140 and a single crystallinelattice mismatched group IV semiconductor alloy layer 150 having asecond lattice constant as described in the fourth embodiment of thepresent invention. The single crystalline lattice mismatched group IVsemiconductor alloy layer 150 may abut the buried oxide layer as shownin FIGS. 5B and 5C, or alternatively, an intervening thinned secondregion 30″ may be present between the single crystalline latticemismatched group IV semiconductor alloy layer 150 and the buriedinsulator layer 20 as shown in FIG. 1F.

The fifth exemplary semiconductor structure further comprises a stack ofsingle crystalline compound semiconductor layers as described above inthe fourth embodiment of the present invention. Specifically, the stackcomprises:

a first single crystalline compound semiconductor layer 160′ abuttingthe single crystalline lattice mismatched group IV semiconductor alloylayer 150, wherein a top portion of the first single crystallinecompound semiconductor layer 160′ has a third lattice constant, whereinthe second lattice constant is between the first lattice constant andthe third lattice constant;

a second single crystalline compound semiconductor layer 162 abuttingand epitaxially aligned to the first single crystalline compoundsemiconductor layer 160′; and

a third single crystalline compound semiconductor layer 164 abutting andepitaxially aligned to the second single crystalline compoundsemiconductor layer 162.

As in the fourth embodiment, layer 162 can be formed of a stack ofmultiple, alternating thin layers of two single crystalline compoundsemiconductors of different compositions as to form multiple quantumwells (MQW), which are well known by people skilled in the art.

The at least one single crystalline group IV semiconductor structure 34may comprise a wave guide. This waveguide may have an increasingcross-sectional area with distance from the stack up to a first distanced1, wherein the distance is the magnitude of the shortest vector of allvectors connecting a given point within the wave guide and any of thepoints within the stack, and the cross-sectional area is measured in theplane perpendicular to the shortest vector.

The at least one single crystalline group IV semiconductor structure 34may farther comprise multiple wave guides. For example, another waveguide having an increasing cross-sectional area with distance from thestack up to a second distance d2, wherein the distance is the magnitudeof the shortest vector of all vectors connecting a given point withinthe another wave guide and any of the points within the stack, and thecross-sectional area is measured in the plane perpendicular to theshortest vector.

The various single crystalline compound semiconductor layers (160′, 162,164) within the stack may be patterned so that the first singlecrystalline compound semiconductor layer 160′ and the third singlecrystalline compound semiconductor layer 164 have different areas andmetal contacts 180 may be formed on at least two of the various singlecrystalline compound semiconductor layers (160′, 162, 164).Specifically, by reducing the area of the second and third singlecrystalline compound semiconductor layers (162, 164) relative to thefirst single crystalline compound semiconductor layer 160′, contact 180may be formed to the first and third single crystalline compoundsemiconductor layers (160′, 164). Optional contact to the second singlecrystalline compound semiconductor layer 162 is explicitly contemplatedherein.

Preferably, the second single crystalline compound semiconductor layer162 comprises a material having a direct band gap and is capable ofamplifying or emitting a laser light. Exemplary materials having adirect band gap and is capable of amplifying or emitting a laser lightinclude GaAs and derived compound semiconductor materials therefrom bypartial substitution of Ga or As by other elements. For a specificexample, the first single crystalline compound semiconductor layer 160′and the third single crystalline compound semiconductor layer 164 maycomprise GaAs_(1−x)P_(x) and the second single crystalline compoundsemiconductor layer 162 may comprise GaAs_(1−y)N_(y), wherein x is inthe range from about 0.001 to about 0.999 and y is in the range fromabout 0.001 to about 0.10.

Preferably, the first single crystalline compound semiconductor layer160′ has a length from about 1 μm to about 1 cm and a width from about200 nm to about 20 μm, wherein the length is greater than the width.

Preferably, the second single crystalline compound semiconductor layer162 has a thickness from about 1 nm to about 100 nm and the first andthird single crystalline compound semiconductor layers (160′, 164) havea thickness from about 50 nm to about 3 μm.

The range of the vertical height of the second single crystallinecompound semiconductor layer 162 may be within the range of the verticalheight of the wave guide. In other words, the top surface of the atleast one single crystalline group IV semiconductor structure 34 islocated above the top surface of the second single crystalline compoundsemiconductor layer 162 and the bottom surface of the at least onesingle crystalline group TV semiconductor structure 34 is located belowthe bottom surface of the second single crystalline compoundsemiconductor layer 162. Such geometric arrangement increases efficiencyof light collection by the at least one single crystalline group IVsemiconductor structure 34, which are at least one wave guide.

While the invention has been described in terms of specific embodiments,it is evident in view of the foregoing description that numerousalternatives, modifications and variations will be apparent to thoseskilled in the art. Accordingly, the invention is intended to encompassall such alternatives, modifications and variations which fall withinthe scope and spirit of the invention and the following claims.

1. A semiconductor structure comprising: a handle substrate, a buriedinsulator layer abutting said handle substrate; at least one singlecrystalline group IV semiconductor structure having a first latticeconstant, abutting said buried insulator layer, and comprising amaterial selected from silicon, germanium, carbon and an alloy thereof asingle crystalline lattice mismatched group IV semiconductor alloy layerlocated on said buried insulator layer and containing a top portionhaving a second lattice constant, wherein said second lattice constantis different from said first lattice constant; and a stack of singlecrystalline compound semiconductor layers, said stack containing: afirst single crystalline compound semiconductor layer abutting saidsingle crystalline lattice mismatched group IV semiconductor alloy layerand having a third lattice constant, wherein said second latticeconstant is between said first lattice constant and said third latticeconstant; a second single crystalline compound semiconductor layerabutting and epitaxially aligned to said first single crystallinecompound semiconductor layer; and a third single crystalline compoundsemiconductor layer abutting and epitaxially aligned to said secondsingle crystalline compound semiconductor layer.
 2. The semiconductorstructure of claim 1, wherein said at least one single crystalline groupIV semiconductor structure comprises a wave guide.
 3. The semiconductorstructure of claim 2, wherein said waveguide has an increasingcross-sectional area with distance from said stack up to a firstdistance, wherein said distance is the magnitude of the shortest vectorof all vectors connecting a given point within said wave guide and anyof the points within said stack, and said cross-sectional area ismeasured in the plane perpendicular to said shortest vector.
 4. Thesemiconductor structure of claim 2, further comprising a near-infraredtransparent layer abutting said stack and said wave guide.
 5. Thesemiconductor structure of claim 2, wherein said second singlecrystalline compound semiconductor layer comprises a material having adirect band gap and is capable of amplifying or emitting a laser beam.6. The semiconductor structure of claim 5, wherein said first singlecrystalline compound semiconductor layer and said third singlecrystalline compound semiconductor layer comprise GaAs_(1−x)P_(x) andsaid second single crystalline compound semiconductor layer comprisesGaAs_(1−y)N_(y), wherein x is in the range from about 0.001 to about0.999 and y is in the range from about 0.001 to about 0.10.
 7. Thesemiconductor structure of claim 6, wherein said first singlecrystalline compound semiconductor layer has a length from about 1 μm toabout 1 cm and a width from about 200 nm to about 20 μm, wherein saidlength is greater than said width.
 8. The semiconductor structure ofclaim 6, wherein the range of the vertical height of said second singlecrystalline compound semiconductor layer is within the range of thevertical height of said wave guide.
 9. A semiconductor structurecomprising: a handle substrate, a buried insulator layer abutting saidhandle substrate; a first single crystalline group IV semiconductorlayer vertically abutting said buried insulator layer and having a firstlattice constant, and comprising a material selected from silicon,germanium, carbon and an alloy thereof; a second single crystallinegroup IV semiconductor layer vertically abutting said buried insulatorlayer, disjoined from said first single crystalline group IVsemiconductor layer, and containing having said first lattice constant,and comprising the same material as said first single crystalline groupIV semiconductor structure; a single crystalline lattice mismatchedgroup IV semiconductor alloy layer vertically abutting said secondsingle crystalline group IV semiconductor layer and containing a topportion having a second lattice constant, wherein said second latticeconstant is different from said first lattice constant; and at least onesingle crystalline compound semiconductor layer abutting said singlecrystalline lattice mismatched group IV semiconductor alloy layer andhaving a third lattice constant, wherein said second lattice constant isbetween said first lattice constant and said third lattice constant,wherein a top surface of said first single crystalline group IVsemiconductor structure and a top surface of said at least one singlecrystalline compound semiconductor layer are on the same lithographiclevel.
 10. The semiconductor structure of claim 9, wherein said topsurface of said first single crystalline group IV semiconductorstructure and said top surface of said at least one single crystallinecompound semiconductor layer have a vertical distance less than 1,000nm.
 11. A semiconductor structure comprising: a handle substrate, aburied insulator layer abutting said handle substrate; a singlecrystalline group IV semiconductor layer vertically abutting said buriedinsulator layer and having a first lattice constant, and comprising amaterial selected from silicon, germanium, carbon and an alloy thereof;a single crystalline lattice mismatched group IV semiconductor alloylayer vertically abutting said buried insulator layer and containing atop portion having a second lattice constant, wherein said secondlattice constant is different from said first lattice constant; and atleast one single crystalline compound semiconductor layer abutting saidsingle crystalline lattice mismatched group IV semiconductor alloy layerand having a third lattice constant, wherein said second latticeconstant is between said first lattice constant and said third latticeconstant, wherein a top surface of said first single crystalline groupIV semiconductor structure and a top surface of said at least one singlecrystalline compound semiconductor layer are on the same lithographiclevel.
 12. The semiconductor structure of claim 11, wherein said topsurface of said first single crystalline group IV semiconductorstructure and said top surface of said at least one single crystallinecompound semiconductor layer have a vertical distance less than 1,000nm.
 13. A method of forming a semiconductor structure, comprising:providing a semiconductor-on-insulator layer having a single crystallinegroup IV semiconductor layer having a first lattice constant, whereinsaid single crystalline group IV semiconductor layer comprises amaterial selected from silicon, germanium, carbon and an alloy thereof;forming at least one isolation trench in said single crystalline groupIV semiconductor layer and forming a first region and a second regionout of the remaining portions of said single crystalline group IVsemiconductor layer, wherein said first and second regions are separatedby said at least one isolation trench; masking said first region with aninorganic masking layer or a near-infrared wavelength transparent layer;forming a single crystalline lattice mismatched group IV semiconductoralloy layer abutting said second region and containing a top portionhaving a second lattice constant, wherein said second lattice constantis different from said first lattice constant; and epitaxially growingat least one single crystalline compound semiconductor layer abuttingsaid single crystalline lattice mismatched group IV semiconductor alloylayer, wherein said single crystalline compound semiconductor layer hasa third lattice constant, and wherein said second lattice constant isbetween said first lattice constant and said third lattice constant. 14.The method of claim 13, said forming of said single crystalline group IVsemiconductor alloy comprises: forming another group IV region directlyon said second region, wherein said another group IV region comprises atleast one different group IV element from the element of said singlecrystalline group IV semiconductor layer; and annealing said anothergroup IV region and said second region to diffuse the compositionalinterface between the said another group IV region and said secondregion to form a single alloyed region with either graded or uniformcomposition, which constitutes said single crystalline group IVsemiconductor alloy.
 15. The method of claim 13, wherein said forming ofsaid single crystalline lattice mismatched group IV semiconductor alloylayer comprises selective epitaxial deposition of a single crystallinelattice mismatched group IV semiconductor alloy layer directly on saidsecond portion, while said single crystalline lattice mismatched groupIV semiconductor alloy layer does not substantially grow over saidinorganic masking layer or said near-infrared wavelength transparentlayer.
 16. The method of claim 13, wherein said forming of said singlecrystalline lattice mismatched group IV semiconductor alloy layercomprises: non-selective epitaxial deposition of a single crystallinelattice mismatched group IV semiconductor alloy layer directly on saidsecond portion, while forming a non-single crystalline group IVsemiconductor alloy on said inorganic masking layer or saidnear-infrared wavelength transparent layer; and removing said non-singlecrystalline group IV semiconductor alloy from above said inorganicmasking layer or said near-infrared wavelength transparent layer. 17.The method of claim 13, further comprising thinning said second regionprior to forming of said single crystalline lattice mismatched group IVsemiconductor alloy layer.
 18. The method of claim 13, furthercomprising forming at least one single crystalline group IVsemiconductor structure out of said first region.
 19. The method ofclaim 18, wherein said at least one single crystalline group IVsemiconductor structure is a wave guide having an increasingcross-sectional area with distance from said stack up to a firstdistance, wherein said distance is the magnitude of the shortest vectorof all vectors connecting a given point within said wave guide and anyof the points within said stack, and said cross-sectional area ismeasured in the plane perpendicular to said shortest vector.
 20. Themethod of claim 13, wherein said epitaxially growing of at least onesingle crystalline compound semiconductor layer comprises: epitaxiallygrowing a first single crystalline compound semiconductor layer havingsaid third lattice constant directly on said single crystalline latticemismatched group IV semiconductor alloy layer; epitaxially growing asecond single crystalline compound semiconductor layer directly on saidfirst single crystalline compound semiconductor layer; and epitaxiallygrowing a third single crystalline compound semiconductor layer directlyon second single crystalline compound semiconductor layer.